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Imaging Single Dopant Atoms and Nanoclusters in Highly n-type Bulk Si
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- Journal:
- Microscopy and Microanalysis / Volume 8 / Issue S02 / August 2002
- Published online by Cambridge University Press:
- 01 August 2002, pp. 1614-1615
- Print publication:
- August 2002
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Implant Dose and Spike Anneal Temperature Relationships
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- Journal:
- MRS Online Proceedings Library Archive / Volume 669 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, J8.1
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- 2001
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The Effect of Carbon/Self-Interstitial Clusters on Carbon Diffusion in Silicon Modeled by Kinetic Monte Carlo Simulations
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- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B7.2
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- 2000
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Atomistic Model of Transient Enhanced Diffusion and Clustering of Boron In Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 341
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- 1997
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Strained Layer Semiconductor Films: Structure and Stability
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- Journal:
- MRS Online Proceedings Library Archive / Volume 102 / 1987
- Published online by Cambridge University Press:
- 26 February 2011, 405
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- 1987
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Initial Stages of Interface Formation in the Si/Sn System
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- Journal:
- MRS Online Proceedings Library Archive / Volume 77 / 1986
- Published online by Cambridge University Press:
- 26 February 2011, 703
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- 1986
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Growth of Group IV-IV Heterostructures: Initial Stages of Interface Formation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 67 / 1986
- Published online by Cambridge University Press:
- 25 February 2011, 251
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- 1986
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